N and C atoms in R Ar N2 CH4 Flowing Afterglows at High Pressure
0N and C-atoms in R (Ar)-N2-CH4 Flowing Afterglows at High Pressure
Layman Abstract: This study examines how nitrogen (N) atoms are produced in plasma and afterglow conditions at high gas pressures, including atmospheric pressure. The research focuses on high-frequency (HF) discharges in nitrogen (N₂) and argon-nitrogen (Ar-N₂) gas mixtures, using frequencies ranging from 13.6 MHz to 2450 MHz.
Key findings:
The plasma length increases as the frequency decreases and as the nitrogen content in the Ar-N₂ mixture is reduced.
The recombination of nitrogen atoms (which reduces their availability) is significantly lowered when argon is added to nitrogen, making N-atoms more abundant.
In Ar-N₂ and Ar-CH₄ afterglows, nitrogen and carbon atom densities reached approximately 10¹⁵ cm⁻³ and 10¹² cm⁻³, respectively.
When methane (CH₄) was added in small amounts (x = 10⁻³ – 10⁻²), there was a noticeable drop in nitrogen and carbon atoms at higher methane concentrations, likely due to reactions forming CH₃ radicals.
A mixture of Ar-17%N₂-1%CH₄ at 14 Torr produced CH₃ radicals at a density of 4 × 10¹¹ cm⁻³.
These results help in understanding how to optimize nitrogen atom production for applications in material processing and chemical reactions.
View Book: https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH20
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Related Keywords
N and C-atoms
Flowing Afterglows
plasma and afterg
N-atom production
N-atom density
HF plasmas