N, H and C atoms Concentrations in Flowing Afterglows of Microwave RN2 H2 and RN2 CH4 Discharges
0N, H and C-atoms Concentrations in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH4 Discharges with R=N2, He, Ar and Their Applications to TiO2 Surface Nitriding
Layman Abstract: This study explores how flowing afterglow plasmas can be used for gentle surface treatments, particularly in medical sterilization. The research focuses on understanding how different reactive atoms (N, H, C, and O) behave in plasma environments and how they interact with surfaces.
Key findings include:
The study measured the density of hydrogen (H), carbon (C), and nitrogen (N) atoms in plasma afterglows using different gas mixtures (N₂-H₂ and N₂-CH₄) at low pressures.
Various active nitrogen species (such as NH, CN, and N₂⁺) were identified in early and late plasma afterglows.
Oxygen (O) atoms and nitrogen oxide (NO) molecules from air impurities were also detected.
The probability of reactive atoms being lost when they hit quartz surfaces was calculated, showing that H, O, and C atoms have different surface interaction rates.
The study also examined how H and C atoms affect nitrogen absorption into TiO₂ surfaces, which is important for material coatings and sterilization applications.
This research helps improve plasma-based sterilization and surface modification techniques for medical and industrial applications.
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Related Keywords
afterglow plasmas
soft surface treatments
sensitive materials
sterilization of medical instruments
C-atoms density
Microwave afterglows
Ar gas mixtures
N-atom inclusion in 𝑇𝑖𝑂2 surface